Ion Beam Sputtering: Definition and Applications

What is ion beam deposition?
The process makes it possible for thin films to be deposited. In some cases, the thin films are etched. For etching, the ion beam is pointed to a material to be patterned. In deposition, an ion beam strikes and sputters a material. The material will then coat the substrate.

What is ion beam sputtering?
It is a type of ion beam deposition process, says Science Direct. In these cases, the target is typically outside of the ion source.

What are its applications?
Some of the applications fit for ion beam sputtering include laser bar coating for individual bars, single cavity filter along with three cavities mirrors. A ring laser gyroscope or RLG is also included.

What are the advantages?
This process offers several advantages. These include:

*Unique coating properties, wherein the high-kinetic energy ion beam can result in superior adhesion as well as high density
*Better control over kinetic energy as well as on the current density of ions
*Gain directional control of ion beams as well
*Get high deposition rates
*Zero gas atom incorporation
*No substrate heating too
*Less worry and stress because of low pressure working conditions
*Reduces porosity in the films deposited

What are the disadvantages?
While ion beam sputtering is a good option for many applications and the advantages it brings, it does come with a bit of disadvantage. You will need to invest in a separate ion source to make the process possible. Also, maintenance of the ion source can be challenging and costly. However, if that’s not a problem, then ion beam sputtering might just be the solution you need.

For help, look to experts and ask how you can get use the process for applications in your project. That should help you get off to a good start.

Be the first to like.

Leave a Reply

Your email address will not be published. Required fields are marked *

four × 3 =